BiOCl辅助低温二维纳米片

Qin, Biao; Saeed, Muhammad Zeeshan; Qiuqiu, Li; Manli, Zhu; Feng, Ya; Ziqi, Zhou; Jingzhi, Fang; Hossain, Mongur; Zhang, Zucheng; Yucheng, Zhou; Huangfu, Ying; Song, Rong; Jingmei, Tang; Bailing, Li; Jialing, Liu; Wang, Di; Kun, He; Hongmei, Zhang; Wu, Ruixia; Zhao, Bei; Jia, Li; Liao, Lei; Wei, Zhongming; Li, Bo; Xiangfeng, Duan; Duan, Xidong

BiOCl辅助低温二维纳米片

兼容BEOL工艺

一种普适的低温生长策略，可在280–500 °C合成27种超薄二维材料，比传统盐辅助CVD低200–300 °C，所得材料性能与高温生长相当，可直接用于半导体后道集成。

Qin, Biao · Saeed, Muhammad Zeeshan · Qiuqiu, Li · Manli, Zhu · Feng, Ya · Ziqi, Zhou · Jingzhi, Fang · Hossain, Mongur · Zhang, Zucheng · Yucheng, Zhou · Huangfu, Ying · Song, Rong · Jingmei, Tang · Bailing, Li · Jialing, Liu · Wang, Di · Kun, He · Hongmei, Zhang · Wu, Ruixia · Zhao, Bei · Jia, Li · Liao, Lei · 魏钟鸣 · Li, Bo · Xiangfeng, Duan · 段曦东

Nature Communications 2023

技术优势

合成27种超薄二维材料

生长温度280–500 °C

比盐辅助CVD低约200–300 °C

电学、磁学、光学性能与高温生长相当